Photoresists

material properties:
most relevant chemical non-resistance: acetone

process parameters:
wavelength of laser: 730 nm
used chemicals: developer for photoresists, adhesive agent
min. structure wide: 300 nm
aspect ratio: 150
multiphoton effect is used in this process

Contact:

Fraunhofer IBMT

Fraunhofer-Institute for Biomedical Engineering
Head of Department Biomedical Microsystems
Dr. Thomas Velten
Ensheimer Strasse 48
66386 St. Ingbert
Germany

phone: +49 (0)6894 980-301
thomas.velten@ibmt.fraunhofer.de
IBMT homepage

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Micro-Fluidics Interest Group